Classical optical lithography is diffraction limited to writing features of a size or greater, where is the optical wavelength. Using nonclassical photon-number states, entangled at a time, we show that it is possible to write features of minimum size in an -photon absorbing substrate. This result allows one to write a factor of more elements on a semiconductor chip. A factor of can be achieved easily with entangled photon pairs generated from optical parametric down-conversion. It is shown how to write arbitrary 2D patterns by using this method.
- Received 4 January 2000
©2000 American Physical Society