Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit

Agedi N. Boto, Pieter Kok, Daniel S. Abrams, Samuel L. Braunstein, Colin P. Williams, and Jonathan P. Dowling
Phys. Rev. Lett. 85, 2733 – Published 25 September 2000
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Abstract

Classical optical lithography is diffraction limited to writing features of a size λ/2 or greater, where λ is the optical wavelength. Using nonclassical photon-number states, entangled N at a time, we show that it is possible to write features of minimum size λ/(2N) in an N-photon absorbing substrate. This result allows one to write a factor of N2 more elements on a semiconductor chip. A factor of N=2 can be achieved easily with entangled photon pairs generated from optical parametric down-conversion. It is shown how to write arbitrary 2D patterns by using this method.

  • Received 4 January 2000

DOI:https://doi.org/10.1103/PhysRevLett.85.2733

©2000 American Physical Society

Authors & Affiliations

Agedi N. Boto1, Pieter Kok2, Daniel S. Abrams1, Samuel L. Braunstein2, Colin P. Williams1, and Jonathan P. Dowling1,*

  • 1Jet Propulsion Laboratory, California Institute of Technology, Mail Stop 126-347, 4800 Oak Grove Drive, Pasadena, California 91109
  • 2Informatics, University of Wales, Bangor LL57 1UT, United Kingdom

  • *Electronic address: Jonathan.P.Dowling@jpl.nasa.gov

Comments & Replies

Comment on “Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit”

Girish S. Agarwal, Robert W. Boyd, Elna M. Nagasako, and Sean J. Bentley
Phys. Rev. Lett. 86, 1389 (2001)

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Vol. 85, Iss. 13 — 25 September 2000

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