Instability of Kinetic Roughening in Sputter-Deposition Growth of Pt on Glass

J. H. Jeffries, J.-K. Zuo, and M. M. Craig
Phys. Rev. Lett. 76, 4931 – Published 24 June 1996
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Abstract

Using scanning tunneling microscopy, we have studied the kinetic roughening in the growth of Pt sputter deposited on glass at room temperature for a film thickness range of 15–140 nm. The growth exhibits an irregularly growing mound morphology and shows an instability with anomalous scaling behavior characterized by the ln(t) dependence of the local slope, where t is the growth time, and also by the roughness exponent α0.9 and interface growth exponent β0.26. These characteristics clearly indicate that the growth is consistent with a statistical model of linear diffusion dynamics.

  • Received 15 January 1996

DOI:https://doi.org/10.1103/PhysRevLett.76.4931

©1996 American Physical Society

Authors & Affiliations

J. H. Jeffries1, J.-K. Zuo1, and M. M. Craig2

  • 1Department of Physics and Astronomy, Southwest Missouri State University, Springfield, Missouri 65804
  • 2Department of Biomedical Sciences, Southwest Missouri State University, Springfield, Missouri 65804

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Vol. 76, Iss. 26 — 24 June 1996

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