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    Experimental evidence for zero-correlation-energy deep defects in intrinsic hydrogenated amorphous silicon

    John M. Essick and J. David Cohen

    • Department of Physics, University of Oregon, Eugene, Oregon 97403

    Phys. Rev. Lett. 64, 3062 – Published 18 June, 1990

    DOI: https://doi.org/10.1103/PhysRevLett.64.3062

    Abstract

    Depletion-width-modulated ESR spectroscopy together with junction-capacitance techniques yield the total spin and charge change associated with the emission of electrons from deep defects (D) in intrinsic a-Si:H samples. We find that, in contrast to n-type doped samples, the predominant transition is from the D0 to D+ charge state near midgap. However, the magnitude of spin to charge change is too small for a defect having a significantly positive correlation energy, Ueff; rather, it agrees with a nearly zero value of Ueff (-50<Ueff<+80 meV) between the singly and doubly occupied charge states.

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