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    Dispersive Transport and Recombination Lifetime in Phosphorus-Doped Hydrogenated Amorphous Silicon

    J. M. Hvam* and M. H. Brodsky

    • IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598

    • *Permanent address: Department of Physics, Odense University, DK-5230 Odense, Denmark.

    Phys. Rev. Lett. 46, 371 – Published 2 February, 1981

    DOI: https://doi.org/10.1103/PhysRevLett.46.371

    Abstract

    The recombination lifetime in phosphorus-doped hydrogenated amorphous silicon is determined from the dispersive photocurrent decay following a short-pulse excitation. The electron drift mobility and dispersion parameter α are obtained as well. It is found that α is temperature dependent as expected for extended-state transport controlled by multiple trapping. A lower limit to the extended-state mobility is determined: μc>~1 cm2/V.s.

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