Role of Activated Chemisorption in Gas-Mediated Electron Beam Induced Deposition

James Bishop, Charlene J. Lobo, Aiden Martin, Mike Ford, Matthew Phillips, and Milos Toth
Phys. Rev. Lett. 109, 146103 – Published 3 October 2012

Abstract

Models of adsorbate dissociation by energetic electrons are generalized to account for activated sticking and chemisorption, and used to simulate the rate kinetics of electron beam induced chemical vapor deposition (EBID). The model predicts a novel temperature dependence caused by thermal transitions from physisorbed to chemisorbed states that govern adsorbate coverage and EBID rates at elevated temperatures. We verify these results by experiments that also show how EBID can be used to deposit high purity materials and characterize the rates and energy barriers that govern adsorption.

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  • Received 18 July 2012

DOI:https://doi.org/10.1103/PhysRevLett.109.146103

© 2012 American Physical Society

Authors & Affiliations

James Bishop, Charlene J. Lobo, Aiden Martin, Mike Ford, Matthew Phillips, and Milos Toth*

  • School of Physics and Advanced Materials, University of Technology, Sydney, P.O. Box 123, Broadway, New South Wales 2007, Australia

  • *Milos.Toth@uts.edu.au

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Issue

Vol. 109, Iss. 14 — 5 October 2012

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