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    Doping-Induced Polyamorphic Transitions in Fluorite Oxides

    Hao Yang1,*, Qiaotong Luan2,*, Qing Zhang3, Yongqing Sun2, Weijie Zheng2, Zhen Wang4, Huan-hua Wang4, Xiaohui Liu3,†, Zheng Wen2,‡ et al.

    Zhaoru Sun1,§

    • 1School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China
    • 2College of Electronics and Information and Shandong Key Laboratory of Micro-Nano Packaging and System Integration, Qingdao University, Qingdao 266071, China
    • 3School of Physics, Shandong University, Ji’nan 250100, China
    • 4Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China

    • *These authors contributed equally to this work.
    • †Contact author: liuxiaohui@sdu.edu.cn
    • ‡Contact author: zwen@qdu.edu.cn
    • §Contact author: sunzhr@shanghaitech.edu.cn

    Phys. Rev. Lett. 137, 036101 – Published 16 July, 2026

    DOI: https://doi.org/10.1103/16bf-nm1m

    Abstract

    Fluorite oxides, such as HfO2, exhibit rich and tunable phase behaviors, making them promising candidates for next-generation electronic devices. In this field, a key challenge consists in the design of amorphous HfO2-based high-k materials with both structural and performance stability. Here, using molecular dynamics simulations supported by experimental measurements, we reveal that Ba doping stimulates a polyamorphic transition in HfO2, yielding a semiordered amorphous phase characterized by amorphized oxygens embedded within an ordered metal sublattice. We find that this phase arises from degenerate short-range symmetry breaking modes, consistent with Pauling’s parsimony rule. Notably, the semiordered amorphous structure is thermodynamically stable and displays a wider bandgap and higher dielectric constant than the conventional continuous-random-network amorphous structure, owing to suppressed subgap states and increased Born effective charges. We further demonstrate that this structural motif generalizes to Ba-, Sr-, and Ca-doped HfO2 and ZrO2, establishing a broadly applicable strategy for designing high-performance amorphous dielectrics.

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