Learn about our response to COVID-19, including freely available research and expanded remote access support.
  • Open Access

Crystallization of silicon nanoclusters with inert gas temperature control

Junlei Zhao, Vidyadhar Singh, Panagiotis Grammatikopoulos, Cathal Cassidy, Kengo Aranishi, Mukhles Sowwan, Kai Nordlund, and Flyura Djurabekova
Phys. Rev. B 91, 035419 – Published 15 January 2015

Abstract

We analyze the fundamental process of crystallization of silicon nanoclusters by means of molecular dynamics simulations, complemented by magnetron-sputter inert gas condensation, which was used to synthesize polycrystalline silicon nanoclusters with good size control. We utilize two well-established Si interatomic potentials: the Stillinger-Weber and the Tersoff III. Both the simulations and experiments show that upon cooling down by an Ar gas thermal bath, initially liquid, free-standing Si nanocluster can grow multiple crystal nuclei, which drive their transition into polycrystalline solid nanoclusters. The simulations allow detailed analysis of the mechanism, and show that the crystallization temperature is size-dependent and that the probability of crystalline phase nucleation depends on the highest temperature the cluster reaches during the initial condensation and the cooling rate after it.

  • Figure
  • Figure
  • Figure
  • Figure
  • Figure
  • Figure
  • Figure
10 More
  • Received 22 September 2014
  • Revised 9 December 2014

DOI:https://doi.org/10.1103/PhysRevB.91.035419

This article is available under the terms of the Creative Commons Attribution 3.0 License. Further distribution of this work must maintain attribution to the author(s) and the published article’s title, journal citation, and DOI.

Published by the American Physical Society

Authors & Affiliations

Junlei Zhao1, Vidyadhar Singh2, Panagiotis Grammatikopoulos2, Cathal Cassidy2, Kengo Aranishi2, Mukhles Sowwan2,3, Kai Nordlund1, and Flyura Djurabekova1

  • 1Department of Physics and Helsinki Institute of Physics, University of Helsinki, P.O. Box 43, FIN-00014 Helsinki, Finland
  • 2Nanoparticles by Design Unit, Okinawa Institute of Science and Technology (OIST) Graduate University, 1919-1 Onna-Son, Okinawa, 904-0495, Japan
  • 3Nanotechnology Research Laboratory, Al-Quds University, East Jerusalem, P.O. Box 51000, Palestine

Article Text

Click to Expand

References

Click to Expand
Issue

Vol. 91, Iss. 3 — 15 January 2015

Reuse & Permissions
APS and the Physical Review Editorial Office Continue to Support Researchers

COVID-19 has impacted many institutions and organizations around the world, disrupting the progress of research. Through this difficult time APS and the Physical Review editorial office are fully equipped and actively working to support researchers by continuing to carry out all editorial and peer-review functions and publish research in the journals as well as minimizing disruption to journal access.

We appreciate your continued effort and commitment to helping advance science, and allowing us to publish the best physics journals in the world. And we hope you, and your loved ones, are staying safe and healthy.

Ways to Access APS Journal Articles Off-Campus

Many researchers now find themselves working away from their institutions and, thus, may have trouble accessing the Physical Review journals. To address this, we have been improving access via several different mechanisms. See Off-Campus Access to Physical Review for further instructions.

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Reuse & Permissions

It is not necessary to obtain permission to reuse this article or its components as it is available under the terms of the Creative Commons Attribution 3.0 License. This license permits unrestricted use, distribution, and reproduction in any medium, provided attribution to the author(s) and the published article's title, journal citation, and DOI are maintained. Please note that some figures may have been included with permission from other third parties. It is your responsibility to obtain the proper permission from the rights holder directly for these figures.

×

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×