Abstract
It is proposed that the chemical equilibrium of hydrogen is an important factor in determining the structure of thin films deposited from silane-hydrogen plasmas. Hydrogen interacts with the silicon network to optimize the local bonding configurations. Raising the effective hydrogen chemical potential reduces the disorder of hydrogenated amorphous silicon films and eventually induces a transition to crystallinity.
- Received 28 June 1990
DOI:https://doi.org/10.1103/PhysRevB.43.2454
©1991 American Physical Society

