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Hydrogen chemical potential and structure of a-Si:H

R. A. Street
Phys. Rev. B 43, 2454(R) – Published 15 January 1991
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Abstract

It is proposed that the chemical equilibrium of hydrogen is an important factor in determining the structure of thin films deposited from silane-hydrogen plasmas. Hydrogen interacts with the silicon network to optimize the local bonding configurations. Raising the effective hydrogen chemical potential reduces the disorder of hydrogenated amorphous silicon films and eventually induces a transition to crystallinity.

  • Received 28 June 1990

DOI:https://doi.org/10.1103/PhysRevB.43.2454

©1991 American Physical Society

Authors & Affiliations

R. A. Street

  • Xerox Palo Alto Research Center, Palo Alto, California 94304

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Vol. 43, Iss. 3 — 15 January 1991

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