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Effects of disorder on electronic structures of a-Si:H and a-SiO2

Jeyasingh Nithianandam and Stephen E. Schnatterly
Phys. Rev. B 40, 11786 – Published 15 December 1989
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Abstract

Si L23 x-ray emission spectra from c-Si, doped and intrinsic a-Si:H, quartz, and a-SiO2 are presented. The first and second moments of the valence-band transition density of states of each of these samples were computed. The variance of the disorder potential that characterizes the amorphous network was found for the amorphous samples from their second moments. Lifetime broadening as a function of energy in the valence band of silicon samples was found to vary significantly between the crystalline and amorphous structures.

  • Received 13 February 1989

DOI:https://doi.org/10.1103/PhysRevB.40.11786

©1989 American Physical Society

Authors & Affiliations

Jeyasingh Nithianandam and Stephen E. Schnatterly

  • Jesse Beams Laboratory of Physics, University of Virginia, Charlottesville, Virginia 22901

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Vol. 40, Iss. 17 — 15 December 1989

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