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Carrier Distribution Control in van der Waals Heterostructures of MoS2 and WS2 by Field-Induced Band-Edge Engineering

Mina Maruyama, Kosuke Nagashio, and Susumu Okada
Phys. Rev. Applied 14, 044028 – Published 16 October 2020

Abstract

The electronic properties of van der Waals heterostructures composed of MoS2 and WS2 under a perpendicular electric field are studied in terms of field strength, electron doping concentration, and interlayer stacking arrangement based on the density-functional theory. The calculation results show that accumulated carrier distribution can be controlled by tuning the field direction, field strength, and doping concentration. The electron is localized on the MoS2 layer on the positively charged electrode side under a strong positive field with a low doping concentration, whereas they are extended throughout both the MoS2 and WS2 layers under a strong negative field. Stacking misorientation between the layers further enhances the electron localization under a positive field and delocalization under a strong negative field. The stacking arrangement and electric field allow additional tuning of the electronic properties of van der Waals heterostructures.

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  • Received 14 July 2020
  • Revised 26 August 2020
  • Accepted 17 September 2020
  • Corrected 13 January 2021

DOI:https://doi.org/10.1103/PhysRevApplied.14.044028

© 2020 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter & Materials Physics

Corrections

13 January 2021

Correction: The previously published Figure 3 was incorrect and has been replaced.

Authors & Affiliations

Mina Maruyama1,*, Kosuke Nagashio2, and Susumu Okada1,†

  • 1Department of Physics, Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8571, Japan
  • 2Department of Materials Engineering, Graduate School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan

  • *mmaruyama@comas.frsc.tsukuba.ac.jp
  • sokada@comas.frsc.tsukuba.ac.jp

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Issue

Vol. 14, Iss. 4 — October 2020

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