Atom-resolved surface chemistry using scanning tunneling microscopy

Phys. Rev. Lett. 60, 1049 – Published 14 March 1988
R. Wolkow and Ph. Avouris


We use scanning tunneling microscopy to investigate the reactivity of the dangling-bond states of Si(111)-(7×7). The reaction with NH3 is used as a prototype. We find that Si rest atoms are more reactive than Si adatoms and that center adatoms are more reactive than corner adatoms. Using atom-resolved electronic spectra, we probe the dangling-bond states on both clean and NH3-exposed surfaces. We find significant interactions and charge transfer between sites which strongly influence surface reactivity.


  • Received 7 January 1988
  • Published in the issue dated 14 March 1988

© 1988 The American Physical Society

Authors & Affiliations

R. Wolkow and Ph. Avouris

  • IBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, New York 10598

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