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Local-field corrections to surface and interface core-level shifts in insulators

Phys. Rev. B 46, 12884(R) – Published 15 November 1992
Eli Rotenberg and Marjorie A. Olmstead


We present a model for the extra-atomic contributions to core-level shifts in insulating thin films on polarizable substrates. The final-state shift is calculated from the screening-dependent local fields at a photoemitting atom and shown to be comparable to the initial-state Madelung potential shift in polar crystals. For Xe(111) films, our model completely accounts for experimental results. For NaCl(100) and CaF2(111) surfaces, we present predictions of surface core-level shifts for simple bulk terminations. We discuss corrections which can be incorporated into our model.

DOI: http://dx.doi.org/10.1103/PhysRevB.46.12884

  • Received 19 June 1992
  • Published in the issue dated 15 November 1992

© 1992 The American Physical Society

Authors & Affiliations

Eli Rotenberg

  • Department of Physics, University of California, Berkeley, California 94720

Marjorie A. Olmstead

  • Department of Physics, University of Washington, FM-15, Seattle, Washington 98195

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